Semiconductor Industry Association

Comments and Letters: 09/06/22

SIA Comments on the OSTP RFI on the PFAS Strategic Plan

Environment, Health & Safety

Comments and Letters: 07/29/22

SIA Comments on n-Methylpyrrolidone (NMP) Draft Revision to TSCA Risk Determination

Environment, Health & Safety

Comments and Letters: 07/22/22

Request to Delay Disposition of the Federal Helium System

Environment, Health & SafetySupply Chain Security

Comments and Letters: 07/18/22

SIA Comments on the Concept Draft for the Maine PFAS in Products Program

Environment, Health & Safety

Comments and Letters: 06/22/22

Coalition to the Senate in Support of Ratification of the Kigali Amendment to the Montreal Protocol

Environment, Health & Safety

Comments and Letters: 06/17/22

SIA Comments on the SEC Proposal on Climate-Related Disclosures

Environment, Health & Safety

Brochures and One Pagers: 04/21/22

Industry Facts

Anti-CounterfeitingDomestic ManufacturingEmerging TechnologiesEnvironment, Health & SafetyExport ControlIntellectual PropertyOverviewResearchSupply Chain SecurityTaxTradeWorkforce & Immigration

White Papers: 04/20/22

The essential use of fluorochemicals in lithographic patterning and semiconductor processing

Christopher K. Ober, Florian Käfer, Jingyuan Deng, “The essential use of fluorochemicals in lithographic patterning and semiconductor processing,” J. Micro/Nanopattern. Mater. Metrol. 21(1), 010901 (2022), doi: 10.1117/1.JMM.21.1.010901, available at http://dx.doi.org/10.1117/1.JMM.21.1.010901

Environment, Health & Safety